Abstract
This work demonstrates the hybrid poly-Si nanosheet channels junctionless (JL) field-effect transistors (FET). The hybrid P/N/P double nanosheet channels JL-FFT exhibits the excellent electrical performances in terms of a high I <sub>on</sub> /I <sub>off</sub> current ratio (>10 <sup>7</sup> ), subthreshold swing (176mV/dec), and a small DIBL (13mV/V). These properties are achieved by reducing the effective channel thickness determined by the channel/substrate/channel junction. Furthermore, this stacked hybrid P/N/P double nanosheet channels JL-FET is a promising candidate for high-density 3D stacked IC applications.