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On refining standard cell placement for self-aligned double patterning
Conference paper

On refining standard cell placement for self-aligned double patterning

Ye-Hong Chen, Sheng-He Wang and Ting-Chi Wang
Proceedings of the 2017 Design, Automation and Test in Europe, DATE 2017, pp.1492-1497
05/2017

Abstract

Computer Networks and Communications Hardware and Architecture Safety Risk Reliability and Quality
In this paper, we study the problem of refining a standard cell placement for self-aligned double patterning (SADP), which asks to simultaneously refine a detailed placement and find a valid SADP layout decomposition such that both overlay violation and wirelength are as small as possible. We first present an algorithm that adopts the technique of white space insertion for an SADP-aware single-row cell placement problem. Based on the single-row algorithm, we then describe an approach to the addressed placement refinement problem. Finally, we report encouraging experimental results to support the efficacy of our approach.

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