Abstract
A novel approach for electron beam (e-beam) detection is demonstrated in this work for the first time. The proposed on-wafer electronic layer detectors array (ELDA) features full CMOS-compatibility, fast response, and wide dynamic range, while the response of e-beam is recorded on the detectors array without power source, where data are read out during off-line testing, providing timely feedback of e-beam dosage distributions for IC processing lines for maintaining stable settings in advanced lithographic systems.