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Optical residual stress measurement in TFT-LCD panels
Conference paper

Optical residual stress measurement in TFT-LCD panels

Wei-Chung Wang and Po-Chi Sung
Proceedings of SPIE - The International Society for Optical Engineering, Vol.10329, 103291R
2017

Abstract

low-level stress Mura photoelasticity Residual stress spectrometer TFT-LCD thin glass plate transmissivity spectrum Electronic Optical and Magnetic Materials Condensed Matter Physics Computer Science Applications Applied Mathematics Electrical and Electronic Engineering
The residual stress of the glass substrate might be one of causes to produce the non-uniform light distribution defect, i.e. Mura, in thin film transistor-liquid crystal display (TFT-LCD) panels. Glass is a birefringent material with very low birefringence. Furthermore, the thinner and thinner thickness request from the market makes the traditional photoelasticity almost impossible to measure the residual stresses produced in thin glass plates. Recently, a low-level stress measurement method called transmissivity extremities theory of photoelasticity (TEToP) was successfully developed to measure the residual stress in glass plate. Besides, to measure the stress of the glass plate in the TFT-LCD panel whose rear surface may has different kinds of coatings, an advanced reflection photoelasticity was also developed. In this paper, three commercially available glass plates with 0.33mm nominal thickness and three glass circular disks with different coatings were inspected to verify the feasibility of the TEToP and the advanced reflection photoelasticity, respectively.

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