Abstract
In this paper, patterning of self-assembled nanoparticles by using a shaped electron-beam exposure system with commercial chemically amplified resists (CAR) was demonstrated.
- Title
- Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists
- Translated title
- Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists
- Creators - without role
- C.I. Kuo - National Tsing Hua UniversityH.L. Chen - National Institutes of Applied ResearchY.H. Chu - National Tsing Hua UniversityF.K. Liu - National Institutes of Applied ResearchF.H. Ko - National Institutes of Applied ResearchT.C. Chu - National Tsing Hua University
- Identifiers
- 4891140402; 9784891140403; 9957773276206774
- Copyright
- © 2003 Japan Soc. of Applied.
- Academic Unit
- Department of Materials Science and Engineering, College of Engineering, National Tsing Hua University
- Language
- English
- Resource Type
- Conference paper
- Publication Details
- Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003, pp.224-225