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Plasmon-induced Charge Transport at Transition Metal Nitride-Semiconductor Interfaces via in Situ Nanoimaging
Conference paper

Plasmon-induced Charge Transport at Transition Metal Nitride-Semiconductor Interfaces via in Situ Nanoimaging

Min-Wen Yu, Satoshi Ishii, Satish Laxman Shinde, Nicholaus Kevin Tanjaya, Kuo-Ping Chen and Tadaaki Nagao
2021 Conference on Lasers and Electro-Optics, CLEO 2021 - Proceedings
05/2021

Abstract

Computer Networks and Communications Electrical and Electronic Engineering Electronic Optical and Magnetic Materials Instrumentation Atomic and Molecular Physics and Optics
Photoexcited Kelvin probe force microscope is used to image hot carriers excited in transition metal nitride-semiconductor heterostructures. Both hot holes are hot electron injections are revealed depending on the carrier types of the semiconductors.

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