Progress and outlook of lithography for semiconductor IC

Conference paper

Progress and outlook of lithography for semiconductor IC

Proceedings of CICC

2009

Abstract

Optical lithography;immersion lithography;EUV lithography;e-beam lithography;resolution enhancement;multiple pattering

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Title: Progress and outlook of lithography for semiconductor IC
Creators - without role: 本堅林
Identifiers: 9957774885806774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper
Publication Details: Proceedings of CICC