- Title
- Protruding Design Effect of Poly Gate on Nanoscale NMOSFETs with Advanced Strain Engineering
- Creators - without role
- C. C. Lee - 國立清華大學工學院動力機械工程學系C. H. LiuH. H. Teng
- Publication Details
- 6th International Conference on Technological Advances of Thin Films & Surface Coatings (ThinFilms2012) 6th International Conference on Technological Advances of Thin Films & Surface Coatings (ThinFilms2012)
- Identifiers
- 9957775402106774
- Academic Unit
- Department of Power Mechanical Engineering, College of Engineering, National Tsing Hua University
- Language
- Traditional Chinese
- Resource Type
- Conference paper
Conference paper
Protruding Design Effect of Poly Gate on Nanoscale NMOSFETs with Advanced Strain Engineering
6th International Conference on Technological Advances of Thin Films & Surface Coatings (ThinFilms2012) 6th International Conference on Technological Advances of Thin Films & Surface Coatings (ThinFilms2012)
2012
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