Refractive Index Variation of Amorphous Ta2O5 Film Fabricated by Ion Beam Sputtering with RF Bias Power

$Refractive Index Variation of Amorphous Ta2O5 Film Fabricated by Ion Beam Sputtering with RF Bias Power$

Conference paper

C. Y. Huang, H. M. Ku, Y. P. Tsai, W. K. Chen and S. Chao

International Conference on Optics-photonics Design & Fabrication

2008

Abstract

Refractive Index Variation;Amorphous;Ta2O5 Film;Ion Beam Sputter;RF Bias Power

1 Record Views

Title: Refractive Index Variation of Amorphous Ta2O5 Film Fabricated by Ion Beam Sputtering with RF Bias Power
Creators - without role: C. Y. Huang
H. M. Ku
Y. P. Tsai
W. K. Chen
S. Chao - 國立清華大學電機資訊學院電機工程學系
Identifiers: 9957768905906774
Academic Unit: College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper
Publication Details: International Conference on Optics-photonics Design & Fabrication