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Relatively large electric-field induced electron drift velocity observed in an InxGa1-xAs-based p-i-n semiconductor nanostructure
Conference paper   Peer reviewed

Relatively large electric-field induced electron drift velocity observed in an InxGa1-xAs-based p-i-n semiconductor nanostructure

W. Liang, K.T. Tsen, D.K. Ferry, Meng-Chyi Wu, Chong-Long Ho and Wen-Jeng Ho
Semiconductor Science and Technology, Vol.19(4 SPEC. ISS.)
04/2004

Abstract

Transient subpicosecond Raman spectroscopy has been used to measure electron transport properties in an In x Ga 1-x As-based semiconductor nanostructure under the application of an electric field. The deduced electron drift velocity has been found to be significantly larger than either GaAs or InP-based p-i-n nanostructures under similar experimental conditions. We attribute this finding to both the smaller electron effective mass and the larger Γ to L(X) energy separations in In x Ga 1-x As. The experimental results are compared with ensemble Monte Carlo calculations.

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