Resolution enhancement techniques and mask manufacturability for sub-wavelength lithography

Linard Karklin; Burn J. Lin

doi:10.1117/12.392103

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Conference paper

Resolution enhancement techniques and mask manufacturability for sub-wavelength lithography

Linard Karklin and Burn J. Lin

Proceedings of SPIE - The International Society for Optical Engineering, Vol.4066, pp.40-46

2000

DOI: https://doi.org/10.1117/12.392103

Appears in keyword about Physics

Abstract

Electronic

Optical and Magnetic Materials

Condensed Matter Physics

Computer Science Applications

Applied Mathematics

Electrical and Electronic Engineering

A comparative study is carried out, focusing on two resolution enhancement techniques: alternating (strong) PSM and sub-resolution assists (scattering bars). The applicability of both to the manufacturing of integrated circuits (IC) of 130 nm and below is emphasized.

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Title: Resolution enhancement techniques and mask manufacturability for sub-wavelength lithography
Translated title: Resolution enhancement techniques and mask manufacturability for sub-wavelength lithography
Creators - without role: Linard Karklin - Numerical Technologies , Inc
Burn J. Lin - Numerical Technologies , Inc
Publication Details: Proceedings of SPIE - The International Society for Optical Engineering, Vol.4066, pp.40-46
Identifiers: 9957775755106774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: English
Resource Type: Conference paper

Resolution enhancement techniques and mask manufacturability for sub-wavelength lithography

Abstract

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