Abstract
In this work, a novel fabrication process of self-formed polymer nanopillars by reactive ion etching (RIE) is proposed. During this one-step RIE process, polymer nanopillars were generated adjacent to glass slide that was partially covered on treated polymer of either PDMS or Parylene C. The surface morphologies and water contact angles were compared for different RIE parameters of RF-power and etching time. The aspect-ratio and water contact angle of nanopillar could reach 10 and 162.6°, respectively. Furthermore, the mechanism of this novel fabrication process was established based on the evidences of nanopillar distribution and XPS surface analysis. ©2007 IEEE.