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SiC epi-channel lateral MOSFETs
Conference paper   Peer reviewed

SiC epi-channel lateral MOSFETs

Cheng-Tyng Yen, Mietek Bakowski, Chien-Chung Hung, Sergey Reshanov, Adolf Schöner, Chwan-Ying Lee, Lurng-Shehng Lee, Jeng-Hua Wei, Ting-Yu Chiu and Chih-Fang Huang
Materials Science Forum, Vol.778-780, pp.927-930
2014

Abstract

4H-SiC Buried channel Lateral Mobility MOSFET
SiC lateral MOSFETs with multi-layered epi-channels were studied in this work. The epi-channel consisting of a high concentration n-type epilayer sandwiched between two lightly doped p-type layers showed a maximum field effect mobility of 17 cm 2 /V.s, as compared to 1.53 cm 2 /V.s for inversion type devices without epi-channels. These devices are normally-off with an average threshold voltage of 1.34V. © (2014) Trans Tech Publications, Switzerland.

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