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Simulation for Copper Stress-Induced Voiding at Via Bottom and Its Microstructure Dependence
Conference paper

Simulation for Copper Stress-Induced Voiding at Via Bottom and Its Microstructure Dependence

Robin C. J. Wang, L. D. Chen, C. C. Lee, K. Wu and K. S. Chang-Liao
2006 ANSYS Taiwan User Conference 2006 ANSYS Taiwan User Conference, pp.147-152
2006

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