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Single-crystal SiC resonators by photoelectrochemical etching
Conference paper   Peer reviewed

Single-crystal SiC resonators by photoelectrochemical etching

Mohammad M. Islam, Chih-Fang Huang and Feng Zhao
Materials Science Forum, Vol.717-720, pp.529-532
2012

Abstract

Photoelectrochemical etching Resonator SiC Single crystal
In this paper, we report single-crystal 4H-SiC resonant structures fabricated by dopant-selective photoelectrochemical etching. The frequency response of the resonant beams was characterized by a dynamic scanning method using AFM with the beams excited by a piezoelectric actuator under atmosphere pressure and room temperature. The beam with a length of 35 μm shows mechanical resonance at 945 kHz. The Young's modulus of single-crystal SiC was derived from the measured resonant frequency. Single-crystal 4H-SiC resonators developed in this study fully exploit the excellent electrical, mechanical, and chemical properties of SiC, while dopant-selective photoelectrochemical etching technique significantly simplifies the fabrication process. © (2012) Trans Tech Publications.

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