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Single crystal rare earth oxides epitaxially grown on GaN
Conference paper   Open access

Single crystal rare earth oxides epitaxially grown on GaN

M. Hong, A.R. Kortan, J. Kwo, J.P. Mannaerts, C.M. Lee and J.I. Chyi
IEEE International Symposium on Compound Semiconductors, Proceedings, pp.495-500
2000

Abstract

New single cyrstals of Gd 2 O 3 and Y 2 O 3 were found to grow epitaxially on GaN in ultra-high vacuum. In-situ reflection high-energy electron diffraction reveals a six-fold symmetry in the in-plane epitaxy of the rare earth oxides. Single-crystal x-ray diffraction measurements find that these single-crystal oxide films are indeed the high temperature hexagonal phases of the sesquioxides, stabilized by the GaN substrate epitaxy. Despite a large mismatch in lattice constant, the fully relaxed oxide films are of excellent structural quality.
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