- Title
- Strain Engineering of Nanoscale Si PMOSFET Devices with SiGe Alloy Integrated with CESL Stressors
- Creators - without role
- C. C. Lee - 國立清華大學工學院動力機械工程學系S. T. ChangC. C. HuangC. Y. Li
- Publication Details
- 9th International Nanotech Symposium & Exhibition (NANO KOREA 2011) 9th International Nanotech Symposium & Exhibition (NANO KOREA 2011)
- Identifiers
- 9957776730006774
- Academic Unit
- Department of Power Mechanical Engineering, College of Engineering, National Tsing Hua University
- Language
- Traditional Chinese
- Resource Type
- Conference paper
Conference paper
Strain Engineering of Nanoscale Si PMOSFET Devices with SiGe Alloy Integrated with CESL Stressors
9th International Nanotech Symposium & Exhibition (NANO KOREA 2011) 9th International Nanotech Symposium & Exhibition (NANO KOREA 2011)
2011
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