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Strain Engineering of Nanoscale Strained Si MOS Devices
Conference paper

Strain Engineering of Nanoscale Strained Si MOS Devices

B. F. Hsieh, S. T. Chang, W. C. Wang, M. N. Liao, C. C. Lee and J. Huang
6th International Conference on Silicon Epitaxy and Heterostructures (ICSI-6) 6th International Conference on Silicon Epitaxy and Heterostructures (ICSI-6)
2009

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