Stress Impact of a Tensile CESL on the Nanoscale Strained NMOSFETs with a Silicon-Carbon Alloy Stressor

Conference paper

C. C. Lee, S. T. Chang, C. C. Huang and C. Y. Li

9th International Nanotech Symposium & Exhibition (NANO KOREA 2011) 9th International Nanotech Symposium & Exhibition (NANO KOREA 2011)

2011

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Title: Stress Impact of a Tensile CESL on the Nanoscale Strained NMOSFETs with a Silicon-Carbon Alloy Stressor
Creators - without role: C. C. Lee - 國立清華大學工學院動力機械工程學系
S. T. Chang
C. C. Huang
C. Y. Li
Publication Details: 9th International Nanotech Symposium & Exhibition (NANO KOREA 2011) 9th International Nanotech Symposium & Exhibition (NANO KOREA 2011)
Identifiers: 9957774116606774
Academic Unit: Department of Power Mechanical Engineering, College of Engineering, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper