Stress polarity in bias-temperature instability on MOSFETs with HfO2/LaOx and HfO2/AlOx dielectric stacks

Conference paper

Chun-Chang Lu, Kuei-Shu Chang-Liao, Yu-Fen Cheng, Che-Hao Tsao and Tien-Ko Wang

2009

Abstract

Stress polarity;bias-temperature;instability;MOSFETs;HfO2/LaOx;HfO2/AlOx;dielectric stacks

1 Record Views

Title: Stress polarity in bias-temperature instability on MOSFETs with HfO2/LaOx and HfO2/AlOx dielectric stacks
Creators - without role: Chun-Chang Lu
Kuei-Shu Chang-Liao - 國立清華大學原子科學院工程與系統科學系
Yu-Fen Cheng
Che-Hao Tsao
Tien-Ko Wang
Identifiers: 9957776224706774
Academic Unit: Institute of Nuclear Engineering and Science, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper