Abstract
Soft lithography followed by etching is used to pattern compound semiconductor pieces with dense arrays of sub-100 nm features. A variety of possible applications in nanophotonics and optoelectronic devices are discussed. ©2007 IEEE.
- Title
- Sub-100 nm soft lithography for optoelectronics applications
- Creators - without role
- K. Meneou - University of Illinois Urbana-ChampaignKEH-YUNG CHENG - University of Illinois Urbana-Champaign
- Publication Details
- Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS, pp.331-332
- Identifiers
- 142440925X; 9781424409259; 9957769221006774
- Academic Unit
- National Tsing Hua University
- Language
- English
- Resource Type
- Conference paper