Succeeding optical lithography with multiple E-beam direct write

Conference paper

Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC, pp.416-417

2007

Abstract

Hardware and Architecture

Electrical and Electronic Engineering

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Title: Succeeding optical lithography with multiple E-beam direct write
Translated title: Succeeding optical lithography with multiple E-beam direct write
Creators - without role: Burn J. Lin - Taiwan Semiconductor Manufacturing Company (Taiwan)
Identifiers: 4990247248; 9784990247249; 9957769522506774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: English
Resource Type: Conference paper
Publication Details: Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC, pp.416-417