The characteristics of epitaxial SiGe thin films during high-temperature oxidation treatment

Conference paper

The characteristics of epitaxial SiGe thin films during high-temperature oxidation treatment

C. T. Chu, B. C. He, M. H. Lin, Y. C. Hiao, C. P. Chou and W. F. Wu

2010

Abstract

epitaxial SiGe thin films;high-temperature oxidation treatment

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Title: The characteristics of epitaxial SiGe thin films during high-temperature oxidation treatment
Creators - without role: C. T. Chu
B. C. He
M. H. Lin
Y. C. Hiao
C. P. Chou
W. F. Wu - 國立清華大學原子科學院工程與系統科學系
Identifiers: 9957769108306774
Academic Unit: Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper