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The development of ultrathin Zr-Cu-Ni-Al-N thin film metallic glass as a diffusion barrier in Cu-Si interconnect
Conference paper

The development of ultrathin Zr-Cu-Ni-Al-N thin film metallic glass as a diffusion barrier in Cu-Si interconnect

J. Lee and J. G. Duh
一〇五年中國材料科學學會年會 一〇五年中國材料科學學會年會
2016

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