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The spatial distribution of non-linear effects in multi-photon photoemission from metallic adsorbates on Si(1 1 1)
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The spatial distribution of non-linear effects in multi-photon photoemission from metallic adsorbates on Si(1 1 1)

O. Schmidt, G.H. Fecher, Y. Hwu and G. Schönhense
Surface Science, Vol.482-485(PART 1), pp.687-692
06/2001

Abstract

Alloys Electron microscopy Lead Photoelectron emission Silicon Condensed Matter Physics Surfaces and Interfaces Surfaces Coatings and Films Materials Chemistry
Multi-photon excitations from thin metallic films on silicon substrates have been observed utilising photoemission electron microscopy. The photoelectrons have been excited by means of high power femtosecond laser pulses with a photon energy below the work function threshold. The strong spatial variations of the non-linear effects became directly visible in electron emission from the adsorbed thin films. Centres of enhanced photoelectron yield, so-called hot spots, were observed on the surfaces of various samples. The multi-photon electron yield of the metallic films (permalloy and lead) depends strongly on the sample topography and the photon polarisation. © 2001 Elsevier Science B.V.

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