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The study and methodology of defects isolation for contacts of non-isolated active regions on new logic designs
Conference paper

The study and methodology of defects isolation for contacts of non-isolated active regions on new logic designs

C.H. Wang, C.M. Shen, C.J. Lin, Z.H. Lee and J.H. Chou
Conference Proceedings from the International Symposium for Testing and Failure Analysis, Vol.2005, pp.479-483
2005

Abstract

Control and Systems Engineering Safety Risk Reliability and Quality Electrical and Electronic Engineering
With the advancement in technology and lower operating voltage, new standards have evolved in circuit layout and design. Some of these new standards have increased the difficulties of the physical failure analysis process, especially on the front-end. The phenomenon described in this paper is the unusual voltage contrast (VC) and conductive atomic force microscope (C-AFM) curve on a non-isolated active region. The model and mechanism are demonstrated for front-end failure analysis. Based on this, the solution for analysis is investigated. Copyright ©2005 ASM International®.

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