Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process

T. Lin; T. Huang; Y. Yang; K. Tseng; C. Fu

doi:10.1109/NEMS.2014.6908873

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Conference paper

Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process

T. Lin, T. Huang, Y. Yang, K. Tseng and C. Fu

9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014, pp.555-559

23/09/2014

DOI: https://doi.org/10.1109/NEMS.2014.6908873

Abstract

laser interference lithography

Nano-pattern sapphire substrate

Pattern sapphire substrate

This research provides a new approach, laser interference lithography (LIL), to fabricate PSS and NPSS. Yet, there are two ways to pattern hexagonal 2D array on sapphire by LIL. First is multi-exposure LIL, and the second is multi-beam LIL. In conclusion, simulation results in this research may have verified that multi-beam LIL has significantly better throughput than multi-exposure LIL; the result also support the superiority of negative photoresist over positive photoresist.

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Title: Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process
Creators - without role: T. Lin - National Tsing Hua University
T. Huang - Department of Power Mechanical Engineering, National Tsing Hua University
Y. Yang - National Tsing Hua University
K. Tseng - Department of Power Mechanical Engineering, National Tsing Hua University
C. Fu - Department of Power Mechanical Engineering, National Tsing Hua University
Publication Details: 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014, pp.555-559
Identifiers: 9781479947270; 9957777279206774
Academic Unit: National Tsing Hua University
Language: English
Resource Type: Conference paper

Throughput comparison of multi-exposure and multi-beam laser interference lithography on nano patterned sapphire substrate process

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