Abstract
In this research, we describe a new approach, i.e., laser interference lithography (LIL), to fabricating pattern sapphire substrate (PSS) and nanopatterned sapphire substrate (NPSS). There are two ways to pattern hexagonal 2D arrays on sapphire by LIL: multiexposure LIL and multibeam LIL. In conclusion, the simulation results in this research verified that multibeam LIL has significantly better throughput than multiexposure LIL. The result also supports the advantages of a negative photoresist over a positive photoresist. © 2014 The Japan Society of Applied Physics.