Titanium Deposition on the Alumina Particles by Using CVD-FBR Technology

Conference paper

C.-C. Chen, S.-W. Chen and Yee-wen Yen

AIChE Symposium Series;The 1995 AIChE Annual Meeting 1995 AIChE Annual Meeting, Miami, FL, USA. AIChE Symposium Series, Vol.92, p.96

1995

Abstract

Titanium;Alumina;CVD-FBR

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Title: Titanium Deposition on the Alumina Particles by Using CVD-FBR Technology
Creators - without role: C.-C. Chen
S.-W. Chen - 國立清華大學工學院化學工程學系
Yee-wen Yen
Publication Details: AIChE Symposium Series;The 1995 AIChE Annual Meeting 1995 AIChE Annual Meeting, Miami, FL, USA. AIChE Symposium Series, Vol.92, p.96
Identifiers: 9957775904206774
Academic Unit: Department of Chemical Engineering, College of Engineering, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper