Abstract
This study reported a novel method for tuning thin film mechanical properties by means of plasma surface modification. In order to demonstrate the feasibility of this approach, various plasma treatments, including O 2 , H 2 , NH 3 atmospheres, were implemented to tune the Young's modulus and residual stress of SiO 2 film. Without plasma treatment, the static tip deflection of 200μm long SiO 2 cantilever was 9.01μm. After treatment with H 2 , O 2 , and NH 3 plasma, the tip deformation of the treated cantilevers became 10.22μm, 8.28μm, and -6.84μm respectively. The Young's modulus of the SiO 2 cantilever without plasma treatment was 76.3GPa. After treated with H 2 , O 2 , NH 3 plasma, the Young's modului of those treated cantilevers became 70.8 GPa, 74.7 GPa, and 71.4 GPa, respectively. Hence, after H 2 and NH 3 plasma treatment, the equivalent elastic modulus of SiO 2 cantilever could be reduced about 7%.