- Title
- Ultra-thin (AlCrTaTiZr)Nx/AlCrTaTiZr Bilayer Structures of High Diffusion Resistance to Cu Metallization
- Creators - without role
- Shou-Yi Chang - 國立清華大學工學院材料科學工程學系Dao-Sheng Chen
- Publication Details
- Dielectrics for Nanosystems 4: Materials Science, Processing, Reliability, and Manufacturing Proceedings of the Symposium "E2-Dielectrics for Nanosystems 4: Materials Science, Processing, Reliability, and Manufacturing" of the 217th ECS Meeting, Vol.28(2), pp.361-372
- Identifiers
- 9957776307706774
- Academic Unit
- Department of Materials Science and Engineering, College of Engineering, National Tsing Hua University
- Language
- Traditional Chinese
- Resource Type
- Conference paper
Conference paper
Ultra-thin (AlCrTaTiZr)Nx/AlCrTaTiZr Bilayer Structures of High Diffusion Resistance to Cu Metallization
Dielectrics for Nanosystems 4: Materials Science, Processing, Reliability, and Manufacturing Proceedings of the Symposium "E2-Dielectrics for Nanosystems 4: Materials Science, Processing, Reliability, and Manufacturing" of the 217th ECS Meeting, Vol.28(2), pp.361-372
2010
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