Control of contact hole distortion by using polymer deposition process (PDP) for sub-65nm technology and beyond

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Judy Wang, Shing Li Sung, Ma Shawming 和 Shaw-Ming Ma

17th Annual SEMI/IEEE Advanced Semiconductor Manufacturing Conference, ASMC 2006, 卷.2006, 頁碼.83-87

2006

摘要

Contact etch

Dielectric etch

Distortion

PDP

1 檢視次數

題名: Control of contact hole distortion by using polymer deposition process (PDP) for sub-65nm technology and beyond
創作者：: Judy Wang - Applied Materials (United States)
Shing Li Sung - Applied Materials (United States)
Ma Shawming - Applied Materials, Etch Product Business Group, Dielectric Etch Division, United States
Shaw-Ming Ma
總頁數: 5
學術資源類型: 會議論文集
出版日期: 2006
出版資訊: 17th Annual SEMI/IEEE Advanced Semiconductor Manufacturing Conference, ASMC 2006, 卷.2006, 頁碼.83-87
語言: 英語