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Enhanced Electrochemical Migration Resistance of Fine-Pitch Ag Interconnects by Self-Assembly Monolayers
會議論文集

Enhanced Electrochemical Migration Resistance of Fine-Pitch Ag Interconnects by Self-Assembly Monolayers

Fan-Yi Ouyang, Hung-Lin ChenChien-Cheng Chiang
2025 International Conference on Electronics Packaging and iMAPS All Asia Conference (ICEP-IAAC), 頁碼.125-126
15/04/2025

摘要

Ag interconnect Asia Dendrite growth Dendrites (neurons) Electric fields Electrochemical migration Electrolytes Electronics packaging Ions Reliability Self-assembly Self-assembly monolayers Surface resistance Surface treatment
With the miniaturization of electronic devices, the use of fine-pitch interconnects has become mainstream in electronics, making electrochemical migration (ECM) an important reliability issue for interconnects at this scale. This paper modified the surface of Ag interconnects by introducing self-assembled monolayers (SAMs) to enhance ECM resistance in fine-pitch Ag interconnects under humid and biased conditions. The results of water drops show that the surface-treated samples exhibit longer lifetime compared to untreated samples due to the formation of chelating complexes Ag-SR on the Ag surface after surface treatment. The neutral charge of the Ag-SR pair makes it more resistant to migration under the applied electric field in the aqueous electrolyte, which significantly enhances the ECM resistance of the Ag interconnects.

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