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Prediction of Plasma Charging Induced Gate Oxide Tunneling Current and Antenna Dependence by Plasma Charging Probe
會議論文集

Prediction of Plasma Charging Induced Gate Oxide Tunneling Current and Antenna Dependence by Plasma Charging Probe

Shawming Ma 和 J.P. Mcvittie
1996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA, 頁碼.20-23
1996
Web of Science ID: WOS:A1996BG17A00005

摘要

Antenna measurements Current measurement Distortion measurement Plasma applications Plasma measurements Plasma sources Probes Resists Tunneling Voltage

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