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Study of spin coating properties of SU-8 thick-layer photoresist
會議論文集

Study of spin coating properties of SU-8 thick-layer photoresist

R.-H. Chen 和 C.-M. Cheng
Proceedings of SPIE - The International Society for Optical Engineering, 卷.4345, 頁碼.494-501
2001
Web of Science ID: WOS:000175176400052

摘要

Spin coating SU-8 Thick-layer resist Thickness uniformity Rheometers Spin coating Thick films Viscosity Thick film resists Photoresists
In this paper the coating properties including film thickness, thickness uniformity and variation of viscosity of SU8 photoresist were investigated by using a spin coater and rheometer. Experimental results indicate that the coating qualities of SU8 are affected by several factors including the spinning speed, the photoresist viscosity, the initial acceleration and the duration. Some recommendations are presented for increasing the quality of SU8 spin coating in thick-film processing.

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https://www.scopus.com/inward/record.uri?eid=2-s2.0-0034768959&doi=10.1117%2f12.436881&partnerID=40&md5=1ee3f4073fb58f2751caefffbea2b5a3檢視

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