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Template effects on low k materials made from spin-on mesoporous silica
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Template effects on low k materials made from spin-on mesoporous silica

C.-Y. Ting, D.-F. Ouyan, W.-F. Wu 和 B.-Z. Wan
Studies in Surface Science and Catalysis, 卷.146, 頁碼.391-394
2003
DOI: https://doi.org/10.1016/S0167-2991(03)80407-X

摘要

Dielectric materials Film preparation Low-k dielectric Morphology Silica Surface active agents Surface morphology IC industry Low dielectric constants Low-k materials Mesoporous Silica Mesoporous silica film Porous silica Surfactant templating Template effects Mesoporous materials
Mesoporous silica films prepared through surfactant-templating process is one of promising candidates as low-dielectric-constant (k) materials, which is important in the future IC industry. In this paper, the difference of surface morphology and that of electrical properties of mesoporous silica films prepared with different templates are reported. It is suggested that tween is a superior surfactant and a template for making porous silica low k films. © 2003 Elsevier Science B.V. All rights reserved.

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