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量測時間延遲和虛擬量測系統對逐批控制之影響分析以及新穎逐批控制技術之推導
Dissertation

量測時間延遲和虛擬量測系統對逐批控制之影響分析以及新穎逐批控制技術之推導

吳明峰
Doctor of Philosophy (PHD), 國立清華大學, 化學工程學系
2007

Abstract

逐批控制 EWMA 控制器 半導體 化學氣相沉積 混合產品生產 虛擬量測系統 逐步迴歸分析 共變異數分析 時間序例分析 Run-to-Run Metrology delay CVD CuCmp Mixed-product production Virtual Metrology Stepwise Regression ANCOVA Time Serise Semiconductor manufactory EWMA controller
Two problems encountered in many semiconductor manufacturing are metrology delay caused by the equipments and mixture products on producing. For this thesis, we develop some controllers to eliminate the influences of two problems. First, focusing on the metrology delay problem, we deriver an analytic formula of the performance for a single EWMA controller and provide the guideline to reduce the effects of metrology delay system. Additionally, we provide VM (Virtual Metrology) system to solve it and analyze the performance of VM of modeling methods. Finally, we suggest Stepwise method to plug in VM system. Mixed-product production can reduce amount of cost and time in semiconductor manufacturing. However, each product has a different I-O model and it is a big challenge to run-to-run control. In order to solve it, we use an ANCOVA model to deal with the characteristic of mixed products in different platforms, and to correct the modeling error due to mixed products in order to impove the controller performance and quality.

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