E-beam direct-write lithography/nanoimprint lithography and aviation

社論

開放取用(OA)

同儕審查

Journal of Micro/Nanolithography, MEMS, and MOEMS, 卷.6(1), 010101

2007

摘要

Electronic

Optical and Magnetic Materials

Atomic and Molecular Physics

and Optics

Condensed Matter Physics

Mechanical Engineering

Electrical and Electronic Engineering

url

https://doi.org/10.1117/1.2718964檢視

已出版(紀錄版本) 開放

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題名: E-beam direct-write lithography/nanoimprint lithography and aviation
翻譯題名: E-beam direct-write lithography/nanoimprint lithography and aviation
創作者：: Burn J. Lin (作者) - Taiwan Semiconductor Manufacturing Company (Taiwan)
學術資源類型: 社論
出版日期: 2007
出版資訊: Journal of Micro/Nanolithography, MEMS, and MOEMS, 卷.6(1), 010101
語言: 英語