Abstract
DNA carries genetic information, and is a very important material for lives. DNA is nano-size in nature and, more importantly, its specific base paring mechanism makes DNA a fascinating material in nanoscience. Moreover, due to the mature programmable synthesis skill of DNA, taking DNA as a constructing material has attracted great interest in recent years, such as DNA-based nanowires, programmed assembly of DNA-conjugated gold nanoparticles. Although, various nanodevices have been presented by previous researches, fabricating well localized nano structure at the desired places is still a great challenge. In order to solve the problem of precise positioning, numbers of DNA-patterning methods have been proposed. However, most proposed methods still have some limitations and disadvantages. In our research, we aim at the developing an electron beam patterning method to generate DNA patterns at desired location. Two E-beam based approaches are proposed to produce precise DNA patterns in this thesis. First, we directly generate DNA patterns on gold substrate by the deformation of DNA via electron beam bombardment. Second, we pattern DNA on electrified patterns of glass substrate by electron beam induced charges. By using these two techniques, we can simply and precisely locate DNA and on the surface and generate variety of DNA patterns with high stability. This is a step towards possible integration of DNA-based techniques use into regular semiconductor fabrication methods.