Abstract
In this paper, the use of semiconductor process technology in the silicon substrate with tungsten filament as a micro light source provides a stable voltage source to be given filaments, when there is sufficient heat accumulating in the filament, infrared light generates. With the design of photonic crystal models with different cycles on the filament, the light at the visible region can be restrained. Finally, we use silicon isotropic etching for suspension process in order to achieve the results of our research. There are three problems in the old process. The first is the zinc oxide cannot go through the thermal annealing process at a high temperature, so the tungsten film cannot obtain a low resistance, which causes that the heat cannot accumulate on the tungsten. Therefore, the filament is not easy to emit. The second is the problem of the suspension process. The component is susceptible to the surface tension of liquids, which might cause the component to collapse, thus the yield gets lower in the old process. The third is the component area is too large to be packaged. In the new process, the above problems can all be solved efficiently. Finally, it's proved that the photonic crystal can restrain the spectrum of the visible light region with only 1840μm × 1840μm in area.