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Electromagnetic Field Simulation Software Based Nanometer Resistance Analysis for Supporting Parametric Testing and SoC Designs
Thesis

Electromagnetic Field Simulation Software Based Nanometer Resistance Analysis for Supporting Parametric Testing and SoC Designs

Kuan-Chi Shih
Masters, 國立清華大學, 資訊工程學系
2006

Abstract

場解算器 電導矩陣 金屬互連電阻 低頻平面電阻 轉角電阻 基板電阻 凹槽金屬電阻 凡得夢方程式 電阻查表表格 field solver conductance matrix interconnect resistance DC plane resistance corner square resistance substrate resistance slotted Metal resistance Van Der Pauw method resistance look- up table
Due to the semiconductor technology progresses, the process technology improves from .18μm to 90nm, even 65nm. So making high-performance and low-volume chip is a trend. Resistance problems exists in every circuit, especially in high-performance low-volume chip, resistance problems will be even serious than before, such as RC delay, IR drop or substrate coupling. In order to estimate these resistance problem efficient and accurately, software simulation before taping out is necessary. In this thesis we will introduce a field solver called Raphael to help us about the resistance extraction. We will explain the basic knowledge about Raphael and conductance matrix, then show the correctness of Raphael and its application on resistance problems to help IC design. Finally, we will show a way to enhance the speed of resistance extraction in large circuit design.

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