Abstract
Multi-element carbon nitride films based on high-entropy alloys have received lots of attention. In this study, multielement (HfNbSiTaZr) carbon nitride films were designed and deposited at 400 ℃on Si wafers by RF reactive magnetron sputtering in the gaseous mixture Ar + N2 + CH4. By changing nitrogen flow ratio, methane flow ratio and substrate bias, crystal structure, microstructure, hardness and oxidation resistance have been investigated. The results of crystal structure indicate that films with substrate bias or without substrate bias all exhibit FCC structure. Besides, the films with the increasing substrate bias contain denser microstructure but decreasing hardness. In ball-on-disc wearing test, the coatings increasing substrate bias show lower friction coefficient 0.15 and lower wearing rate 0.2 × 106 mm3/Nm. In addition, the film of 50 V substrate bias has good oxidation resistance. After the air annealing at 500 C for 2 h, the oxide layer is just 226 nm on the surface of the coating. The research illustrates the excellent potential of multi-element (HfNbSiTaZr) carbon nitride coating for industrial applications.