N+/P Hybrid Poly-Si Shell Structure Junctionless Field-Effect Transistors by Electron Beam Lithography Dosage Adjusted Mask Method

Thesis

Chiang, Ya-Ying

Masters, 國立清華大學, 工程與系統科學系

2017

Abstract

混合式

無接面場效電晶體

殼狀

電子束微影

多晶矽

Hybrid

Junctionless

Shell

EBL

Polysilicon

abstract hide

1 Record Views

Title: N+/P Hybrid Poly-Si Shell Structure Junctionless Field-Effect Transistors by Electron Beam Lithography Dosage Adjusted Mask Method
Translated title: N+/P Hybrid Poly-Si Shell Structure Junctionless Field-Effect Transistors by Electron Beam Lithography Dosage Adjusted Mask Method
Creators: Chiang, Ya-Ying
Contributors: Wu, Yung-Chun (Advisor)
Awarding Institution: 國立清華大學, 工程與系統科學系; Masters
Theses and Dissertations: Masters, 國立清華大學, 工程與系統科學系
Language: English
Resource Type: Thesis
Date published: 2018