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N型橫向擴散金氧半場效電晶體之基板電流的探討與分析
Thesis

N型橫向擴散金氧半場效電晶體之基板電流的探討與分析

戴冠宇
Masters, 國立清華大學, 電子工程研究所
2008

Abstract

基板電流 橫向擴散金氧半場效電晶體 LDMOS Second substrate current hump Substrate current
In recent years, device has become smaller gradually. Due to the reason the problem of hot-carrier effect becomes more and more important. So in this thesis we study the substrate current and reliability of LDMOSFET. In this thesis we use the BCD 0.6um process and the operate voltage on drain and gate are both 15 volts. We find a new phenomenon of substrate current. There is a second substrate current hump (SSCH) appears. We use TCAD (Tsuprem4 and Medici) to understand and analysis the strange phenomenon. At last we judge the effect of SSCH in this device and try to improve the performance. In this thesis we make a basic theory of the substrate current.

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