Study of Ge CMOS Fin Field-Effect Transistors on SOI substrate

Thesis

Liu, Kai-Ning

Masters, 國立清華大學, 工程與系統科學系

2016

Abstract

互補式電晶體

鍺

矽電晶體結構在絕緣體之上

CMOS

Germaium

SOI

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Title: Study of Ge CMOS Fin Field-Effect Transistors on SOI substrate
Translated title: Study of Ge CMOS Fin Field-Effect Transistors on SOI substrate
Creators: Liu, Kai-Ning
Contributors: Wu, Yung-Chun (Advisor)
Yeh, Mu-Shih (Advisor)
Awarding Institution: 國立清華大學, 工程與系統科學系; Masters
Theses and Dissertations: Masters, 國立清華大學, 工程與系統科學系
Language: English
Resource Type: Thesis
Date published: 2017