Abstract
Moth-eye structure (MES), biologically antireflective structure, can be regarded as an impedance-matching layer in optics. A biological antireflection structure discovered in a kind of nocturnal moth has been studied extensively on account of its tiny optical reflectance and being insensitive to large angle incident light since 1967. A great deal of literature has imitated the MES successfully and obtained the remarkable low reflectance as identical as the measurement result from the eyes of night-flying moth. However, a low-priced high throughput fabrication of MES is still not reported up to now. In this thesis, author manufactures the MES in the Si substrate using directly chemical etching with the advantage of low price and high throughput at the same time. The purely chemical etching assisted with metallic nanocatalyst replaces the advanced lithography and high-aspect-ratio plasma etching in the proposed fabrication. Anodic and cathodic etching is both used to modify the profile and optical characteristic of MES. The contour of MES in this thesis satisfies the requirement in optical design and the average reflectivity is 0.52% within the visible band. Moreover, the reflectivity is almost insensitive to the incident angle till 60□□□The extremely low reflectivity and rapidly simple fabrication has much potential to replace current technique of the micro-texture and antireflection coating. Finally, the wafer-level fabrication of antireflective moth-eye structure for optoelectronic application is fabricated successfully by a rapid and simple method.