Abstract
The application of plasma is very common in industry, like film deposition, etching, cleaning, bacteria killing, surface modification, and so on. In the field of plasma cleaning, it's often used for removal of carbon contaminant when using electron microscope. Therefore, we want to develop a plasma source with high density to have a good effect on plasma cleaning. At the same time, we made a frequency-varied power amplifier which ranges from 10 to 20 MHz to do some experiments for observing some frequency effects on hollow cathode plasma source. In experiments, I used Langmuir probe to measure some basic plasma characteristics of argon plasma and use high-voltage probe and current transformer to measure the characteristics of discharging of argon plasma. By the results of these measurements, we can know more about the mode transition of a hollow cathode. After knowing the characteristics of a hollow cathode, we measured the characteristics of plasma of oxygen and air, and applied to plasma cleaning of PVC and observed the effects on plasma cleaning.