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以化學氣相沉積法成長硼摻雜型石墨烯和新穎氮化矽薄膜前驅物之合成
Thesis

以化學氣相沉積法成長硼摻雜型石墨烯和新穎氮化矽薄膜前驅物之合成

姜妍忻
Masters, 國立清華大學, 化學系
2015

Abstract

化學氣相沉積法 原子層沉積法 摻雜型石墨烯 氮化矽薄膜
Chapter I We synthesized boron-contained polyaromatic hydrocarbon,and it was used to grow boron-doped graphene by chemical vapor deposition, then we got large area and uniform monolayer graphene. We measured and analyzed its physical properties. Boron-doped graphene was patterned and used as anode in a green phosphorescent OLED device that showed an outstanding external quantum efficiency. Chapter II Since electronic devices were miniaturizated, atomic layer deposition (ALD) method for thin film has been focused recently. In this chapter, to produce silicon nitride thin film with using synthesis of novel silicon precursor is our main research goal, by home-made ALD system. Finally, we got the good insulating film.

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