Abstract
This study propose using the scanning immersion lithography (SIL) technique to fabricate the light guide plate (LGP) with random-dotting micro prism array. Via applying a matching liquid between the mask/resist, the diffraction error of the gap can be effectively reduced. In addition, the liquid also act as a lubricant and a buffer for smooth movement of the mask/substrate. These advantages will benefit the performance of scanning lithography with good resolution. The experimental results show that the large-area, 3D microstructure with excellent surface quality (Ra~13 nm) can be successively fabricated based on this method. If combining with the scanning routes along different axes, microstructure with various geometries (pyramid, half- sphere or their fusion) could be generated. Furthermore, the correlation between the microstructure geometry and the SIL parameters was simulated based on experimental results and curve fitting. That means the SIL parameters, including mask shape, exposure intensity and developing time, can be determined if a microstructure with specific geometry is required. Based on this technique, a novel LGP structure with random-dotting 3D micro prism was successively realized by coupling with a double-patterning process. After this exploration, the proposed SIL technique seems has potential to fabricate novel LGP module with high brilliance and high uniformity.