Abstract
In the past few years magnetic multilayers have been the subject of tremendous effect. This effort is mainly based on the very interesting magnetic and electrical phenomena that can be observed in these artificially layered structures exhibiting giant magnetoresistance. Among the methods preparing samples of this effect are mainly based on high vacuum deposition equipment. However, the capability to produce such extremely finely layered materials includes electrodeposition that has the advantages of low cost and high throughput. The purpose of this thesis is to electrodeposit magnetic multilayers exhibiting GMR effect. It is successful to grow magnetic Co-Cu/Cu multilayer exhibiting nano-scale superlattice by pulsed electrodeposition. The magnetization loop doesn't show large antiferromagnetic exchange coupling measured by Magneto-Optic Kerr Effect Technique (MOKE). The maximum measured MR ratio of the electrodeposited magnetic multilayer Si/Cu50A/Pt100A/[(Co85Cu15)20A /Cu20A]20 is 6.8%.